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Journal of Nanomaterials
Volume 2015, Article ID 507656, 7 pages
Research Article

Large-Area Resonance-Tuned Metasurfaces for On-Demand Enhanced Spectroscopy

1National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba 305-0044, Japan
2Graduate School of Pure and Applied Sciences, Tsukuba University, 1-1-1 Tennodai, Tsukuba 305-8571, Japan

Received 20 January 2015; Accepted 17 February 2015

Academic Editor: Antonios Kelarakis

Copyright © 2015 Masanobu Iwanaga et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


We show an effective procedure for lateral structure tuning in nanoimprint lithography (NIL) that has been developed as a vertical top-down method fabricating large-area nanopatterns. The procedure was applied to optical resonance tuning in stacked complementary (SC) metasurfaces based on silicon-on-insulator (SOI) substrates and was found to realize structure tuning at nm precision using only one mold in the NIL process. The structure tuning enabled us to obtain fine tuning of the optical resonances, offering cost-effective, high-throughput, and high-precision nanofabrication. We also demonstrate that the tuned optical resonances selectively and significantly enhance fluorescence (FL) of dye molecules in a near-infrared range. FL intensity on a SC metasurface was found to be more than 450-fold larger than the FL intensity on flat Au film on base SOI substrate.