Surface Patterning of PEDOT:PSS by Photolithography for Organic Electronic Devices

Figure 3

Lift-off processes with parylene. Resist was spin-coated (a), UV exposed (b), and developed (c) on parylene. With etching (d), patterns were transferred to parylene (e). PEDOT:PSS was deposited on patterned parylene (f), and after mechanical peel-off, PEDOT:PSS patterns were left on substrate (g).