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Journal of Nanomaterials
Volume 2015, Article ID 810986, 6 pages
http://dx.doi.org/10.1155/2015/810986
Research Article

Dynamic Deposition of Nanocopper Film on the β-SiCp Surface by Magnetron Sputtering

College of Materials Science & Engineering, Jiamusi University, Jiamusi 154007, China

Received 2 February 2015; Revised 4 May 2015; Accepted 4 May 2015

Academic Editor: Donglu Shi

Copyright © 2015 Hu Ming et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Hu Ming, Zhang Yunlong, Shan Lin, et al., “Dynamic Deposition of Nanocopper Film on the β-SiCp Surface by Magnetron Sputtering,” Journal of Nanomaterials, vol. 2015, Article ID 810986, 6 pages, 2015. https://doi.org/10.1155/2015/810986.