Research Article
Dynamic Deposition of Nanocopper Film on the β-SiCp Surface by Magnetron Sputtering
Figure 2
XRD diffraction spectrum of β-SiC particles with copper film under different experimental conditions. (a) Substrate temperature (S2, S4, and S5), (b) sputtering power (S6, S2, and S7), (c) sputtering time (S1, S2, and S3), and (d) the diffraction peak spectrum of copper (111) diffraction peak spectrum in S5 specimen.
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