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Journal of Nanomaterials
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Journal of Nanomaterials
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2015
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Article
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Fig 1
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Research Article
The Reliability Improvement of Cu Interconnection by the Control of Crystallized
-
Diffusion Barrier
Figure 1
The AES spectra of (a) Ta MN3 and (b) N KL1 taken from TaN-1 and TaN-2 films deposited on SiO
2
.
(a)
(b)