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Journal of Nanomaterials
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Journal of Nanomaterials
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2015
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Article
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Fig 2
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Research Article
The Reliability Improvement of Cu Interconnection by the Control of Crystallized
-
Diffusion Barrier
Figure 2
The XRD patterns of (a) TaN-1 and TaN-2 films and (b) Ta/TaN-1 and Ta/TaN-2 bilayers deposited on SiO
2
.
(a)
(b)