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Journal of Nanomaterials
Volume 2015, Article ID 936876, 7 pages
http://dx.doi.org/10.1155/2015/936876
Research Article

Characterization of Line Nanopatterns on Positive Photoresist Produced by Scanning Near-Field Optical Microscope

1Department of Electrical and Computer Engineering, Florida International University, Miami, FL 33174, USA
2Department of Electrical Engineering, Sharif University of Technology, Azadi Avenue, Tehran 11155-9363, Iran

Received 6 August 2015; Revised 15 September 2015; Accepted 16 September 2015

Academic Editor: Xiaosheng Fang

Copyright © 2015 Sadegh Mehdi Aghaei et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Sadegh Mehdi Aghaei, Navid Yasrebi, and Bizhan Rashidian, “Characterization of Line Nanopatterns on Positive Photoresist Produced by Scanning Near-Field Optical Microscope,” Journal of Nanomaterials, vol. 2015, Article ID 936876, 7 pages, 2015. https://doi.org/10.1155/2015/936876.