Enhanced Response Speed of ZnO Nanowire Photodetector by Coating with Photoresist

Figure 3

Diagrams of the lithography (a–d) and electrodeposition (e, f). (a) ZnO NW UV photodetector; (b) coat photoresist on the photodetector chip; (c) aligning and covering the photomask and exposure to UV light; (d) development of photoresist film; (e) electrodeposition of copper layer; (f) microscopy picture and diagram of the device.

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(b)

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(f)