Structure and Properties of Nanocrystalline (TiZr)_xN_1−x Thin Films Deposited by DC Unbalanced Magnetron Sputtering

Table 1

Deposition conditions of TiZrN thin films.

Precoating conditions
Base vacuum pressure	6.7 10^−4 Pa; (5 10^−6 torr)
Bombardment voltage	−1000 V
Bombardment time	5 min
Coating conditions
Current density	Ti: 0.24 A; Zr: 0.24 A
Working pressure	0.17 Pa; (1.3 10^−3 torr)
Substrate bias	−80 V
Coating temperature	400°C
Deposition time	40 min
Ar flow rate	30 sccm
N2 flow rate	0~2.5 sccm