Structure and Properties of Nanocrystalline (TiZr)_xN_1−x Thin Films Deposited by DC Unbalanced Magnetron Sputtering

Table 2

Summary of the properties of films deposited at various nitrogen flow rates.

Sample numbers	Nitrogen flow rate (sccm)	Thickness (nm)	N/(Ti + Zr) ratio (10%)	Ti/(Ti + Zr) ratio (10%)	FWHM (2θ)		Grain size (nm)		Texture coefficient	Lattice parameter (Å)
					TiZr (002)	TiZrN (111)	TiZr (002)	TiZrN (111)
N00	0	690	0	0.41	0.89	—	9	—	—	—
N04	0.4	641	0.50	0.44	3.72	—	4	—	—	—
N05	0.5	611	0.61	0.43	1.77	—	5	—	—	—
N06	0.6	622	0.71	0.41	—	0.59	—	14	0.61	4.45
N07	0.7	625	0.81	0.38	—	0.46	—	18	0.61	4.45
N10	1	532	0.93	0.41	—	0.42	—	20	0.74	4.43
N13	1.3	413	0.96	0.40	—	0.47	—	18	0.75	4.44
N16	1.6	381	1.05	0.37	—	0.45	—	19	0.86	4.44
N19	1.9	331	0.98	0.40	—	0.48	—	17	0.89	4.44
N22	2.2	277	0.96	0.42	—	0.54	—	15	0.86	4.43
N25	2.5	240	1.03	0.40	—	0.52	—	16	0.71	4.43

The lattice parameters of N06 and N07 were calculated from TiZrN peaks, although those films contained two phases.