Out-of-Plane and In-Plane Magnetization Behavior of Dipolar Interacting FeNi Nanoislands around the Percolation Threshold

Figure 3

The out-of-plane (top panels) and in-plane (bottom panels) ZFC and FCW normalized magnetization response (calculated using (1)) of the nanoisland FeNi film samples (Al₂O₃ (2.1 nm)/FeNi ()/Sitall substrate) with the nominal film thickness of (a) 0.61 nm, (b) 1.10 nm, (c) 1.39 and 1.60 nm, and (d) 1.82 and 2.04 nm. The displayed symbols are larger than the error bars. The solid curves are the guides to the eye.