Electrodeposition-Based Fabrication and Characteristics of Tungsten Trioxide Thin Film

<div>XRD pattern for the WO<sub>3</sub>-coated glass annealed at various <svg height="12.2532pt" id="M46" style="vertical-align:-3.29108pt" version="1.1" viewbox="-0.0498162 -8.96212 12.4956 12.2532" width="12.4956pt" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink"><g transform="matrix(.013,0,0,-0.013,0,0)"><path d="M620 675H597C578 656 570 650 541 650H144C112 650 104 653 94 675H72C59 618 42 552 23 493L53 491C71 534 88 564 105 585C124 608 144 615 238 615H290L197 121C182 40 174 34 88 28L82 0H361L367 28C275 34 266 38 281 121L374 615H441C522 615 543 608 553 583C562 560 566 531 565 493L597 494C603 551 612 629 620 675Z" id="g113-85"></path><glyph.data ascent="3473" descent="-2876" horiz-adv-x="637" vert-adv-y="637"></glyph.data></g><g transform="matrix(.0091,0,0,-0.0091,7.176,3.132)"><path d="M490 97L476 124C442 96 405 70 398 70C392 70 390 78 396 114C419 243 448 379 463 432L457 436C446 436 431 439 418 442C393 447 368 451 343 451C281 451 204 418 155 381C74 320 24 206 24 107C24 23 59 -12 88 -12C118 -12 155 5 191 34C236 70 290 122 328 177H330L312 84C296 0 311 -12 331 -12C355 -12 425 24 490 97ZM374 387C371 367 360 299 347 264C323 202 187 53 142 53C128 53 113 73 113 120C113 224 157 332 221 380C241 395 274 403 303 403C330 403 360 395 374 387Z" id="g50-98"></path><glyph.data ascent="3443" descent="-2856" horiz-adv-x="514" vert-adv-y="514"></glyph.data></g></svg> and an <svg height="11.8174pt" id="M47" style="vertical-align:-3.1815pt" version="1.1" viewbox="-0.0498162 -8.6359 17.428 11.8174" width="17.428pt" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink"><g transform="matrix(.013,0,0,-0.013,0,0)"><path d="M405 650H141L135 622C222 616 230 610 215 535L133 116C118 41 113 33 29 28L23 0H289L295 28C209 33 205 40 219 116L298 535C312 609 317 616 399 622L405 650Z" id="g113-74"></path><glyph.data ascent="3473" descent="-2876" horiz-adv-x="428" vert-adv-y="428"></glyph.data></g><g transform="matrix(.0091,0,0,-0.0091,4.719,3.132)"><path d="M522 166C507 123 488 90 472 71C449 44 419 38 347 38C296 38 261 38 242 51C223 63 217 85 217 132V315H311C398 315 406 310 419 239H453V433H419C406 365 401 358 311 358H217V580C217 609 219 612 251 612H331C400 612 427 604 440 584C453 561 463 541 472 498L506 502C501 558 497 627 497 650H43V618C122 610 130 609 130 520V128C130 46 121 40 30 32V0H521C529 30 552 128 557 162L522 166Z" id="g58-67"></path><glyph.data ascent="1007" descent="-369" horiz-adv-x="580" vert-adv-y="580"></glyph.data></g><g transform="matrix(.0091,0,0,-0.0091,9.997,3.132)"><path d="M43 650V617C122 612 130 606 130 522V128C130 44 122 37 34 32V0H275C400 0 497 25 573 82C652 142 698 229 698 350C698 445 662 518 613 565C549 625 456 650 327 650H43ZM217 544C217 580 220 591 229 599C240 607 264 613 311 613C380 613 437 599 482 570C561 523 598 436 598 336C598 177 511 40 324 40C248 40 217 61 217 135V544Z" id="g58-66"></path><glyph.data ascent="1007" descent="-369" horiz-adv-x="744" vert-adv-y="744"></glyph.data></g></svg> of 5 mA.</div>

Journal of Nanomaterials

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Figure 5

Figure 5: Electrodeposition-Based Fabrication and Characteristics of Tungsten Trioxide Thin Film 