Electrodeposition-Based Fabrication and Characteristics of Tungsten Trioxide Thin Film

Table 1

Process parameters of ED for the WO₃ thin films.

Number	(mA)	(sec.)	(°C)
1	3	30	As-deposited; 250; 500; 700
2		40
3		50
4		60
5	5	30	As-deposited; 250; 500; 700
6		40
7		50
8		60
9	7	30	As-deposited; 250; 500; 700
10		40
11		50
12		60
13	9	30	As-deposited; 250; 500; 700
14		40
15		50
16		60

Only selected WO₃ coated glass to be annealed.