Electrodeposition-Based Fabrication and Characteristics of Tungsten Trioxide Thin Film

Table 2

The average transmittance, reflectivity, and absorptance of the test samples.

Items	Annealing temperature	Region		ITO	WO3-coated glass
			(mA)	—	3				5
			(sec)	—	30	40	50	60	30	40	50	60
Transmittance (%)	As-deposited	VIS		82.0	82.7	81.9	81.3	81.8	82.1	82.9	82.3	82.4
	250			81.5	77.9	77.2	77.0	78.1	76.6	78.5	79.5	79.2
	500			80.0	77.0	77.3	77.0	75.1	74.8	75.6	77.6	77.4
	As-deposited	NIR		25.5	24.9	24.1	22.9	22.5	24.5	23.1	23.9	24.7
	250			26.3	25.5	26.1	24.3	21.3	24.6	24.1	22.1	23.4
	500			78.4	67.2	68.1	69.0	64.5	66.8	66.1	63.9	58.5
Reflectivity (%)	As-deposited	VIS		12.6	12.3	12.7	12.4	12.0	11.4	12.0	12.1	12.0
	250			13.1	17.5	17.4	17.8	16.2	16.9	15.3	16.0	17.2
	500			18.4	16.2	16.1	18.3	17.6	17.7	17.5	18.6	18.8
	As-deposited	NIR		46.7	44.0	44.5	46.5	47.3	45.2	46.7	49.3	48.4
	250			46.6	43.4	45.4	45.2	45.8	43.4	44.5	47.3	49.8
	500			7.7	10.6	9.7	14.6	16.7	12.7	16.6	20.9	25.6
Absorptance (%)	As-deposited	VIS		5.4	4.9	5.4	6.4	6.2	6.5	5.2	5.6	5.6
	250			5.4	4.5	5.4	5.2	5.7	6.5	6.2	4.5	3.7
	500			1.5	6.8	6.6	4.7	7.2	7.6	6.9	3.7	3.8
	As-deposited	NIR		27.8	31.1	31.4	30.7	30.2	30.3	30.2	26.8	26.8
	250			27.1	31.1	28.6	30.5	32.8	32.0	31.4	30.6	26.8
	500			13.9	22.2	22.1	16.4	18.8	20.6	17.3	15.2	16.0