Table of Contents Author Guidelines Submit a Manuscript
Journal of Nanomaterials
Volume 2016, Article ID 7825456, 11 pages
http://dx.doi.org/10.1155/2016/7825456
Research Article

The Optimum Fabrication Condition of p-Type Antimony Tin Oxide Thin Films Prepared by DC Magnetron Sputtering

1Industrial University of HCMC, Ho Chi Minh City 700000, Vietnam
2Faculty of Foundation Sciences, HCMC University of Technology and Education, Ho Chi Minh City 700000, Vietnam
3Faculty of Physics and Engineering Physics, University of Sciences, VNU-HCMC, Ho Chi Minh City 700000, Vietnam
4Faculty of Material Sciences, University of Sciences, VNU-HCMC, Ho Chi Minh City 700000, Vietnam

Received 14 March 2016; Accepted 8 May 2016

Academic Editor: Zhaoyao Zhan

Copyright © 2016 Huu Phuc Dang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Huu Phuc Dang, Quang Ho Luc, Tran Le, and Van Hieu Le, “The Optimum Fabrication Condition of p-Type Antimony Tin Oxide Thin Films Prepared by DC Magnetron Sputtering,” Journal of Nanomaterials, vol. 2016, Article ID 7825456, 11 pages, 2016. https://doi.org/10.1155/2016/7825456.