The Optimum Fabrication Condition of p-Type Antimony Tin Oxide Thin Films Prepared by DC Magnetron Sputtering

Table 1

The results of the Hall measurements of SnO₂ and 15% ATO films that were directly deposited at different temperatures.

(°C)	SnO2					15% ATO
	Sample	(Ω·cm)	(cm^2V^−1s^−1)	(cm^−3)	Type	Sample	(Ω·cm)	(cm^2V^−1s^−1)	(cm^−3)	Type
RT	S1					A1
200	S2	1.0	1.39	−4.5 × 10^18	n	A2	43.8	0.02	−7.1 × 10^18	n
300	S3	3.5	0.51	−3.4 × 10^18	n	A3	1.2	0.44	−1.2 × 10^19	n
400	S4	0.5	2.21	−5.2 × 10^18	n	A4	1.7	2.79	−1.3 × 10^18	n
500	S5	0.05	3.90	−3.6 × 10^19	n	A5	43.6	19.30	7.4 × 10^15	p
500 annealed 600	S6	2.81	1.27	−1.75 × 10^18	n	A6	26.1	3.49	6.9 × 10^16	p