Research Article
Surface Morphology and Electrical Resistivity in Polycrystalline Au/Cu/Si(100) System
Figure 2
SEM images and EDS analysis for the sample of 100 nm thickness. (a) SEM superficial images at 1000x for the annealed sample, (b) EDS analysis of the A and B zones, (c) cross-sectional SEM images at 100000x before annealing, and (d) cross-sectional SEM images at 100000x after annealing treatment.
| (a) |
| (b) |
| (c) |
| (d) |