Surface Morphology and Electrical Resistivity in Polycrystalline Au/Cu/Si(100) System
SEM images and EDS analysis for the sample of 100 nm thickness. (a) SEM superficial images at 1000x for the annealed sample, (b) EDS analysis of the A and B zones, (c) cross-sectional SEM images at 100000x before annealing, and (d) cross-sectional SEM images at 100000x after annealing treatment.
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