Fabrication of a Large-Area Superhydrophobic SiO₂ Nanorod Structured Surface Using Glancing Angle Deposition

Figure 1

Top-view and cross-sectional view SEM images of GLAD SiO₂ nanorods fabricated at different deposition rates of 5 Å/s and 10 Å/s and different substrate rotation speeds of 0.2–20 rpm. The left top inset in each top-view SEM image is the cross-sectional view SEM image. The deposition rate, rotation speed, and the solid fraction are indicated on the right top of each SEM image.

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