Journals
Publish with us
Publishing partnerships
About us
Blog
Journal of Nanomaterials
Journal overview
For authors
For reviewers
For editors
Table of Contents
Special Issues
Journal of Nanomaterials
/
2017
/
Article
/
Fig 3
/
Research Article
Dynamic Interferometry Lithography on a TiO
2
Photoresist Sol-Gel for Diffracting Deflector Module
Figure 3
Interference pattern underneath the phase mask in normal condition. The pattern’s period is half of the masks.