Journal of Nanomaterials / 2018 / Article / Fig 5

Research Article

Graphene Membrane as Suspended Mask for Lithography

Figure 5

(a) SEM image of the four rectangular holes engraved on a GSM, to measure the shift of the deposited pads with the tilting angle: the tilt is along the horizontal side of the 500 × 500 nm2 squares. (b) The shift measurements between the first (right, Al) and the second (left, V) depositions for the squared geometry (on top the scheme of the deposition).
(a)
(b)

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