Journal of Nanomaterials / 2018 / Article / Fig 5

Research Article

Graphene Membrane as Suspended Mask for Lithography

Figure 5

(a) SEM image of the four rectangular holes engraved on a GSM, to measure the shift of the deposited pads with the tilting angle: the tilt is along the horizontal side of the 500 × 500 nm2 squares. (b) The shift measurements between the first (right, Al) and the second (left, V) depositions for the squared geometry (on top the scheme of the deposition).

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