Journal of Nanomaterials / 2018 / Article / Tab 1

Research Article

Graphene Membrane as Suspended Mask for Lithography

Table 1

Summary of the process steps of the CVD growth of graphene on Co. The temperature during the cooling steps has been estimated by a calibrated thermocouple attached to the substrate holder during a dummy deposition process.

Process stepTemperature (°C)Pressure (mbar)Gas flow (sccm)

(i) Heating200 → 600100–1102 = 100
(ii) Heating600 → 1020≈402 = 50
Annealing + CVD1020800–9002/4 = 50/25
(i) Cooling1020 → ≈800≈1.52/2 = 100/50
(ii) Cooling≈800 → ≈200≈12 = 100

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