Graphene Membrane as Suspended Mask for Lithography

Table 1

Summary of the process steps of the CVD growth of graphene on Co. The temperature during the cooling steps has been estimated by a calibrated thermocouple attached to the substrate holder during a dummy deposition process.

Process step	Temperature (°C)	Pressure (mbar)	Gas flow (sccm)
(i) Heating	200 → 600	100–110	2 = 100
(ii) Heating	600 → 1020	≈40	2 = 50
Annealing + CVD	1020	800–900	2/4 = 50/25
(i) Cooling	1020 → ≈800	≈1.5	2/2 = 100/50
(ii) Cooling	≈800 → ≈200	≈1	2 = 100