Optimization of a Hydrothermal Growth Process for Low Resistance 1D Fluorine-Doped Zinc Oxide Nanostructures

Figure 3

Generated contour plot of measured resistance (Ω) when reaction time (in hours) and temperature (in °C) were varied for (a) 10 s, (b) 15 s, and (c) 20 s of Au sputtering time.

(a)

(b)

(c)