Optimization of a Hydrothermal Growth Process for Low Resistance 1D Fluorine-Doped Zinc Oxide Nanostructures

<div>(a) Generated main effect plot of measured resistance (<i>Ω</i>) against sputtering times in seconds (s), hydrothermal reaction times in hours, hydrothermal temperatures in °C. (b) Interaction plot of resistance with sputtering times and hydrothermal temperatures.</div>

Journal of Nanomaterials

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Figure 4

Figure 4: Optimization of a Hydrothermal Growth Process for Low Resistance 1D Fluorine-Doped Zinc Oxide Nanostructures 