Optimization of a Hydrothermal Growth Process for Low Resistance 1D Fluorine-Doped Zinc Oxide Nanostructures

Table 1

Design matrix for I-V measurements.

Standard order	Sputtering time (s)	Temperature (°C)	Reaction time (h)	Resistance (Ω)
1	10	50	6.5	571.43
2	20	50	6.5	28.06
3	10	100	6.5	4074.98
4	20	100	6.5	29.98
5	10	75	3.0	3130.87
6	20	75	3.0	22.57
7	10	75	10.0	2119.09
8	20	75	10.0	64.81
9	15	50	3.0	149.47
10	15	100	3.0	303.95
11	15	50	10.0	94.52
12	15	100	10.0	94.42
13	15	75	6.5	267.38
14	15	75	6.5	240.38
15	15	75	6.5	286.53