Decreased Surface Photovoltage of ZnO Photoanode Films via Optimal Annealing Temperature for Enhanced Photoelectrochemical Performance

Figure 1

(a) Cross-sectional SEM image of the RF-sputtered ZnO film on the ITO prior to annealing. The inset is the top view image. (b) The corresponding XRD pattern of the deposited film.

(a)

(b)