Journal of Nanomaterials / 2019 / Article / Fig 9

Research Article

Comprehensive Study of Kinetics of Processes Competing during PECVD Ultrathin Silicon Layer High-Temperature Annealing

Figure 9

Schematic view of two potential interpretations of complex composition in PECVD Si layer: (a) continuous crystalline silicon “sublayer” and (b) matrix of silicon nanocrystals, both within the oxidized PECVD Si layer.
(a)
(b)

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