Micro- and Nanostructure of Layered Si\Sn\Si Films, Formed by Vapor Deposition

Figure 10

Size distribution of quasispherical formations on the surface of layers of tin and silicon structures: (a) a‐Si (~50 nm)/Sn (~15 nm) and (b) a‐Si (~50 nm)/Sn (~15 nm)/a‐Si ~200 nm) in the approximation of the equivalent disk radius.

(a)

(b)