Micro- and Nanostructure of Layered Si\Sn\Si Films, Formed by Vapor Deposition

Figure 2

SEM imaging of the surface of films deposited from the vapor-gas phase in vacuum on a polished substrate of monocrystalline Si at room temperature: (a) tin; (b) amorphous silicon deposited on top of the tin film. Every layer thickness—100 nm.

(a)

(b)