Micro- and Nanostructure of Layered Si\Sn\Si Films, Formed by Vapor Deposition

Figure 7

AFM image of the surface of layered structures: (a) a‐Si (~50 nm)/Sn (~15 nm)‐tin outside and (b) a‐Si (~50 nm)/Sn (~5 nm)/a‐Si (~200 nm)‐outwardly amorphous silicon on a common substrate of single‐crystal Si.

(a)

(b)