Influence of Deposition Parameters for Cu₂O and CuO Thin Films by Electrodeposition Technique: A Short Review

Figure 10

FESEM images for electrodeposited CuO thin film with various deposition time on indium tin oxide substrate postannealed at 550°C for 120 min. (S1) 300, (S2) 600, (S3) 1,200, and (S4) 1,800 s.