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Journal of Nanotechnology
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Journal of Nanotechnology
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2008
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Article
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Fig 1
/
Research Letter
Achieving High Aspect Ratio of Track Length to Width in Molds for Discrete Track Recording Media
Figure 1
SEM images of developed resist patterns exposed at (a) 300
μ
C/cm
2
and (b) 450
μ
C/cm
2
.
(a)
(b)