Journal of Nanotechnology / 2011 / Article / Fig 3

Research Article

Hydrogenated Nanocrystalline Silicon Thin Films Prepared by Hot-Wire Method with Varied Process Pressure

Figure 3

Low angle X-ray diffraction pattern of some Si:H films deposited at various process pressure by hot wire method.
242398.fig.003

We are committed to sharing findings related to COVID-19 as quickly and safely as possible. Any author submitting a COVID-19 paper should notify us at help@hindawi.com to ensure their research is fast-tracked and made available on a preprint server as soon as possible. We will be providing unlimited waivers of publication charges for accepted articles related to COVID-19.