Journal of Nanotechnology / 2011 / Article / Fig 6

Research Article

Hydrogenated Nanocrystalline Silicon Thin Films Prepared by Hot-Wire Method with Varied Process Pressure

Figure 6

Noncontact atomic force microscopy (NC-AFM) images (topography) of films deposited by hot wire method at various process pressure. (a)  mTorr (a-Si:H). (b)  mTorr (onset of nanocrystallization). (c)  mTorr (nc-Si:H).
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(a)
242398.fig.006b
(b)
242398.fig.006c
(c)

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