Exploration of the Direct Use of Anodized Alumina as a Mold for Nanoimprint Lithography to Fabricate Magnetic Nanostructure over Large Area

Figure 2

SEM plane-view images of (a) AAO mold; inset is the pore diameter distribution, (b) as-imprinted resist by using mold without SiO₂ coating; inset is the magnified view of the indicated area, and (c) as-imprinted resist pillars by using the mold with thin ~2-3 nm SiO₂ coating. Insets in the upper right and left bottom corners are the magnified view and distribution of resist pillar diameter, respectively.

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