Exploration of the Direct Use of Anodized Alumina as a Mold for Nanoimprint Lithography to Fabricate Magnetic Nanostructure over Large Area
Figure 3
SEM plane-view images of (a) AAO mold coated with thin SiO2 layer; inset is the distribution of pore diameter of the mold, (b) the cross-sectional SEM image of as-imprinted resist pillars, and inset is the distribution of resist pillar diameter. Some pillars with smaller height are indicated by white arrows, and (c) plane-view SEM image of FePt dots on Si wafer; inset in the upper right corner is the magnified view and in left bottom corner is the size distribution of FePt dots. Some dots with reduced height are indicated by black arrows in the magnified view.
