Process-Parameter-Dependent Structural, Electrical, and Optical Properties of Reactive Magnetron Sputtered Ag-Cu-O Films

Figure 5

AFM 3D- and 2D- micrographs of Ag-Cu-O films formed at different substrate temperatures: (a) 303 K, (b) 373 K, (c) 473 K, and (d) 523 K.

(a)

(b)

(c)

(d)