Process-Parameter-Dependent Structural, Electrical, and Optical Properties of Reactive Magnetron Sputtered Ag-Cu-O Films

<table>Plots of <svg height="18.725" id="M17" style="vertical-align:-2.3205pt" version="1.1" viewbox="0 0 45.6875 18.725" width="45.6875" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
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</svg> versus photon energy <svg height="15.1125" id="M18" style="vertical-align:-2.3205pt" version="1.1" viewbox="0 0 29.700001 15.1125" width="29.700001" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
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</svg> of Ag-Cu-O films formed at different substrate temperatures: (Ts = - - -<i>▼</i>—303 K, - - -∆- - -373 K, - - -°- - -473 K, - - -■- - -523 K).</table>

Journal of Nanotechnology

fig9

Figure 9

Figure 9: Process-Parameter-Dependent Structural, Electrical, and Optical Properties of Reactive Magnetron Sputtered Ag-Cu-O Films 