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Journal of Nanotechnology
Volume 2012, Article ID 561250, 16 pages
http://dx.doi.org/10.1155/2012/561250
Research Article

Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering

1Department of Innovative System Engineering, Nippon Institute of Technology, Saitama 345-8501, Japan
2Department of Research and Development, OSG Corporation, Aichi 442-8544, Japan

Received 8 December 2011; Accepted 21 February 2012

Academic Editor: Arturo I. Martinez

Copyright © 2012 Shojiro Miyake and Mei Wang. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Shojiro Miyake and Mei Wang, “Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering,” Journal of Nanotechnology, vol. 2012, Article ID 561250, 16 pages, 2012. https://doi.org/10.1155/2012/561250.