Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering

<table class="table-group" width="800px"><tr class="fig-image" id="a"><td><img alt="561250.fig.0021a" src="https://static.hindawi.com/articles/jnt/volume-2012/561250/figures/561250.fig.0021a.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(a) </b>Topographic image of friction</td></tr></table></td></tr><tr class="fig-image" id="b"><td><img alt="561250.fig.0021b" src="https://static.hindawi.com/articles/jnt/volume-2012/561250/figures/561250.fig.0021b.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(b) </b>Cross-section profile of friction distribution</td></tr></table></td></tr></table>

<table>(a) Profile and cross-sectional images of friction distribution and (b) model of friction versus wear track for 4-nm-period (C/BN)n film at 3500 nN load.</table>

Journal of Nanotechnology

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Figure 21

Figure 21: Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering 