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Journal of Nanotechnology
Volume 2014, Article ID 102404, 19 pages
Review Article

Silicon Nanofabrication by Atomic Force Microscopy-Based Mechanical Processing

1Department of Innovative System Engineering, Nippon Institute of Technology, Miyashiro-machi, Saitama 345-8501, Japan
2R&D OSG Corporation, Honnogahara 1-15, Toyokawa 442-8544, Japan
3Park Systems Japan Inc., 1-17-1 Kanda-Nishikicho, Chiyoda-ku, Tokyo 101-0054, Japan

Received 17 December 2013; Revised 3 April 2014; Accepted 7 April 2014; Published 11 May 2014

Academic Editor: Federico Rosei

Copyright © 2014 Shojiro Miyake et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


This paper reviews silicon nanofabrication processes using atomic force microscopy (AFM). In particular, it summarizes recent results obtained in our research group regarding AFM-based silicon nanofabrication through mechanochemical local oxidation by diamond tip sliding, as well as mechanical, electrical, and electromechanical processing using an electrically conductive diamond tip. Microscopic three-dimensional manufacturing mainly relies on etching, deposition, and lithography. Therefore, a special emphasis was placed on nanomechanical processes, mechanochemical reaction by potassium hydroxide solution etching, and mechanical and electrical approaches. Several important surface characterization techniques consisting of scanning tunneling microscopy and related techniques, such as scanning probe microscopy and AFM, were also discussed.