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Journal of Nanotechnology
Volume 2016 (2016), Article ID 1963847, 6 pages
http://dx.doi.org/10.1155/2016/1963847
Research Article

Characteristics of Silicon Dioxide Particles in PCVD Synthesizing Silica Glass Process

China Building Materials Academy, Beijing 100024, China

Received 8 November 2015; Revised 26 January 2016; Accepted 27 January 2016

Academic Editor: Enkeleda Dervishi

Copyright © 2016 Yuancheng Sun et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Yuancheng Sun, Xuefu Song, Xiurong Du, Xiaoqiang Zhang, and Hui Wang, “Characteristics of Silicon Dioxide Particles in PCVD Synthesizing Silica Glass Process,” Journal of Nanotechnology, vol. 2016, Article ID 1963847, 6 pages, 2016. doi:10.1155/2016/1963847