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Journal of Nanotechnology
Volume 2017, Article ID 4862087, 10 pages
https://doi.org/10.1155/2017/4862087
Research Article

Deposition and Characterization of Molybdenum Thin Film Using Direct Current Magnetron and Atomic Force Microscopy

1Faculty of Electronics and Computer Engineering, Universiti Teknikal Malaysia Melaka, Hang Tuah Jaya, 76100 Durian Tunggal, Melaka, Malaysia
2Carbon Research Technology Research Group, Advanced Manufacturing Centre, Faculty of Manufacturing Engineering, Universiti Teknikal Malaysia Melaka, Hang Tuah Jaya, 76100 Durian Tunggal, Melaka, Malaysia
3Institutes of Microengineering and Nanoelectronics (IMEN), Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor, Malaysia

Correspondence should be addressed to Mohd Asyadi Azam; ym.ude.metu@idaysa

Received 9 June 2016; Accepted 29 December 2016; Published 31 January 2017

Academic Editor: María J. Lázaro

Copyright © 2017 Muhtade Mustafa Aqil et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Citations to this Article [5 citations]

The following is the list of published articles that have cited the current article.

  • G. Durai, P. Kuppusami, and K. Viswanathan, “Investigation on microstructure and improved supercapacitive performance of Mn doped CuO thin films prepared by reactive radio frequency magnetron sputtering,” Journal of Materials Science: Materials in Electronics, 2017. View at Publisher · View at Google Scholar
  • Rhonira Latif, Mohd Faizal Aziz, and Burhanuddin Yeop Majlis, “Control of physical and microstructural properties in molybdenum by direct current magnetron sputtering deposition producing bilayer thin film,” Thin Solid Films, 2018. View at Publisher · View at Google Scholar
  • O. Nwakanma, P. Reyes, and S. Velumani, “Electrical, structural, and topographical properties of direct current (DC) sputtered bilayer molybdenum thin films,” Journal of Materials Science: Materials in Electronics, 2018. View at Publisher · View at Google Scholar
  • F M Mwema, O P Oladijo, T S Sathiaraj, and E T Akinlabi, “Atomic force microscopy analysis of surface topography of pure thin aluminum films,” Materials Research Express, vol. 5, no. 4, pp. 046416, 2018. View at Publisher · View at Google Scholar
  • Saeed Ghasemi, Ali Reza Farhadizadeh, Ahmad Ali Amadeh, and Hamid Ghomi, “Structural and morphological properties of TiN deposited by magnetron sputtering,” Surface Topography: Metrology and Properties, vol. 6, no. 4, pp. 045003, 2018. View at Publisher · View at Google Scholar