Experiments on the Release of CMOS-Micromachined Metal Layers

Figure 13

Profile measurement of different 100 $\mu$m CMOS-MEMS membranes composed of one, two and three metal layers. Passivation is around 9 $\mu$m height and substrate around 0 $\mu$m. The membranes were released with pad-etchant after 60 minutes.