Journal of Sensors / 2016 / Article / Fig 1

Research Article

Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer

Figure 1

(a) A thin oxide layer (navy) formed on silicon surface (light blue) by oxygen plasma. (b) Dispersed oxide nanomask formed by etching thin oxide layer with CHF3 plasma. (c) Nanocones etched by mixture plasma of Cl2 and Ar (10 : 1). (d) Nanocone structure after silicon oxide removal by BOE. (e) SEM picture corresponding to (c). (f) SEM picture corresponding to (d).
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