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Journal of Sensors
Volume 2016, Article ID 4019864, 6 pages
Research Article

Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer

Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA

Received 9 March 2016; Accepted 30 March 2016

Academic Editor: Jesus Corres

Copyright © 2016 Jing Jiang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Supplementary Material

The supplementary materials demonstrates that our nano-cone fabrication process is versatile, uniform, and robust. It can etch nano-cones at the backside of a four-inch wafer to uniformly. In addition, this process works robustly for blackening multi-crystalline silicon solar cell and single-crystalline silicon solar cells. From the supplementary, we can compare the color differences of each sample before and after the treatment.

  1. Supplementary Material