Research Article
High Frequency InGaAs MOSFET with Nitride Sidewall Design for Low Power Application
Figure 8
(a) Current gain, unilateral power gain versus frequency (solid: current gain ; open: unilateral power gain ), and (b) parasitic capacitances and versus frequency (solid: ; open: ) of InGaAs MOSFET with sidewall “spacer 2” thickness variation from 2 nm to 10 nm design.
(a) |
(b) |