Computational and Experimental Analysis of a Triode Microfuse with a WO<sub>3</sub> Heater

<table class="figure-group"><tr class="fig-image" id="a"><td><object data="https://static.hindawi.com/articles/js/volume-2023/7525559/figures/7525559.fig.0016a.svgz" name="7525559.fig.0016a" type="image/svg+xml"></object></td></tr><tr class="fig-caption"><td><b>(a) </b>Without annealed condition</td></tr><tr class="fig-image" id="b"><td><object data="https://static.hindawi.com/articles/js/volume-2023/7525559/figures/7525559.fig.0016b.svgz" name="7525559.fig.0016b" type="image/svg+xml"></object></td></tr><tr class="fig-caption"><td><b>(b) </b>Annealed condition</td></tr></table>

<div>Temperature versus sheet resistance characteristics of the SiO<sub>2</sub> substrate-WO<sub>3</sub> heater-Pt doping-Au electrode device. (a) Without annealed condition and (b) 300°C for 10 minutes annealed condition of Argon gas atmosphere at WO<sub>3</sub> nanoparticle film, and their corresponding TCR values.</div>

Journal of Sensors

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Figure 16

Figure 16: Computational and Experimental Analysis of a Triode Microfuse with a WO<sub>3</sub> Heater 

Journal of Sensors

Computational and Experimental Analysis of a Triode Microfuse with a WO3 Heater

Figure 16

Computational and Experimental Analysis of a Triode Microfuse with a WO₃ Heater