Research Article

Coupling and Shielding Properties of the Baffle in ICP System

Figure 6

Simulation of the electron density by sheath model penetration of plasma into slots (a) at various plasma densities, and impact of the slot geometry (b) on plasma presence in the slot. The plots from top to down in column (a) represent simulation results at various bulk plasma density, that is, 1 × 109 cm−3, 5 × 109 cm−3, 1 × 1010 cm−3, 5 × 1010 cm−3, and 1 × 1011 cm−3. Plots in column (b) are computed at bulk plasma density 1 × 1010 cm−3.
541743.fig.006a
(a)
541743.fig.006b
(b)