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Modelling and Simulation in Engineering
Volume 2011, Article ID 931415, 13 pages
Research Article

Plasma and BIAS Modeling: Self-Consistent Electrostatic Particle-in-Cell with Low-Density Argon Plasma for TiC

1Department of Mathematics, Humboldt-University of Berlin, Unter den Linden 6, 10099 Berlin, Germany
2Department of Physics, Humboldt-University of Berlin, 10099 Berlin, Germany

Received 10 May 2011; Accepted 22 June 2011

Academic Editor: Zeki Ayag

Copyright © 2011 Jürgen Geiser and Sven Blankenburg. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


We motivate our study by simulating the particle transport of a thin film deposition process done by PVD (physical vapor deposition) processes. In this paper we present a new model taken into account a self-consistent electrostatic-particle in cell model with low density Argon plasma. The collision model are based of Monte Carlo simulations is discussed for DC sputtering in lower pressure regimes. In order to simulate transport phenomena within sputtering processes realistically, a spatial and temporal knowledge of the plasma density and electrostatic field configuration is needed. Due to relatively low plasma densities, continuum fluid equations are not applicable. We propose instead a Particle-in-cell (PIC) method, which allows the study of plasma behavior by computing the trajectories of finite-size particles under the action of an external and self-consistent electric field defined in a grid of points.