Table of Contents
Textures and Microstructures
Volume 21 (1993), Issue 2-3, Pages 177-193

Graphical Representation of Grain and Hillock Orientations in Annealed Al–1%Si Films

Institut für Metallkunde und Metallphysik der TU, Grosser Bruch 23, Clausthal-Zellerfeld D-38678, Germany

Received 8 December 1992

Copyright © 1993 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


The grain-specific texture of Al–1%Si films on oxidized silicon substrates was studied by transmission electron microscopy. Heat treatments at 400℃ and 550℃ gave rise to the sporadic growth of annealing hillocks. Crystal orientations of individual grains and hillocks were determined by means of on-line interpretation of Kikuchi patterns. Many hillock orientations differ from the sharp 111 fibre texture of the layer. The hillocks are assumed to start growing in layer regions where grain orientations deviate from the main 111 fibre texture. Local texture is represented graphically by orientation images using Miller indices, Euler angles, and Rodrigues vectors as orientation parameters.